Liquid crystal device and method for manufacturing the same

ABSTRACT

A liquid crystal display according to an exemplary embodiment of the present invention includes: a gate line disposed on a first substrate; a gate insulating layer disposed on the gate line; a semiconductor layer disposed on the gate insulating layer; a data line disposed on the semiconductor layer and including a source electrode; a drain electrode disposed on the semiconductor layer and facing the source electrode via the semiconductor layer interposed therebetween; a passivation layer disposed on the data line and the drain electrode; a pixel electrode disposed on the passivation layer and connected to the drain electrode; a first alignment pattern layer disposed on the pixel electrode; and a first alignment layer disposed on the pixel electrode and the first alignment pattern layer and made of a photoalignment material, wherein the first alignment pattern layer includes a plurality of first alignment patterns separated with a predetermined interval, and the first alignment layer has a concave-convex shape including grooves and protrusions of the first alignment layer.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims priority from and the benefit of Korean PatentApplication No. 10-2014-0091125 filed on Jul. 18, 2014, which isincorporated by reference for all purposes as if fully set forth herein.

BACKGROUND

Field

Exemplary embodiments of the present invention relate to a liquidcrystal display and a manufacturing method thereof.

Discussion of the Background

Liquid crystal displays (LCDs) are widely used flat panel displays, andinclude a pair of panels provided with field-generating electrodes and aliquid crystal (LC) layer interposed between the two panels. The LCDdisplays images by applying signals to the field-generating electrodesto generate an electric field in the LC layer that determines theorientation of LC molecules therein to adjust polarization of incidentlight.

The liquid crystal display includes a thin film transistor array paneland a common electrode panel facing each other. The thin film transistorarray panel includes a gate line transmitting a gate signal, a data linetransmitting a data signal and intersecting with the gate line, a thinfilm transistor connected to the gate line and the data line, and apixel electrode connected to the thin film transistor. The commonelectrode panel includes a light blocking member, a color filter, and acommon electrode.

Liquid crystal molecules of the liquid crystal display are initiallyaligned in a predetermined direction by a rubbing process.

As a method to provide a pretilt to the liquid crystal, there are acontact type rubbing method, which includes applying physical pressureto an alignment layer by using a roller, and a photoalignment method,which includes irradiating ultraviolet rays to the alignment layer.

The above information disclosed in this Background section is only forenhancement of understanding of the background of the invention andtherefore it may contain information that does not form the prior artthat is already known in this country to a person of ordinary skill inthe art.

SUMMARY

Exemplary embodiments of the exemplary embodiments of the presentinvention relates to a liquid crystal display to reduce generation ofafterimages by including the photoalignment method when forming thealignment layer.

Additional aspects will be set forth in the detailed description whichfollows, and, in part, will be apparent from the disclosure, or may belearned by practice of the inventive concept.

A liquid crystal display according to an exemplary embodiment of thepresent invention includes: a gate line disposed on a first substrate; agate insulating layer disposed on the gate line; a semiconductor layerdisposed on the gate insulating layer; a data line disposed on thesemiconductor layer and including a source electrode; a drain electrodedisposed on the semiconductor layer and facing the source electrode viathe semiconductor layer interposed therebetween; a passivation layerdisposed on the data line and the drain electrode; a pixel electrodedisposed on the passivation layer and connected to the drain electrode;a first alignment pattern layer disposed on the pixel electrode; and afirst alignment layer disposed on the pixel electrode and the firstalignment pattern layer and made of a photoalignment material, whereinthe first alignment pattern layer includes a plurality of firstalignment patterns separated by a predetermined interval, and the firstalignment layer has a concave-convex shape including grooves andprotrusions of the first alignment patterns.

A manufacturing method of a liquid crystal display according to anexemplary embodiment of the present invention includes: forming a firstdisplay panel; forming a second display panel; and combining the firstdisplay panel and the second display panel. The forming of the firstdisplay panel includes: sequentially forming a gate line, asemiconductor layer, a data line, a drain electrode, a passivationlayer, and a pixel electrode on the first substrate; forming a firstalignment pattern layer on the passivation layer and the pixelelectrode; and forming a first alignment layer on the pixel electrodeand the first alignment pattern layer, wherein the first alignmentpattern layer includes a plurality of first alignment patterns disposedto be separated by a predetermined interval, and the first alignmentlayer has a concave-convex shape including grooves and protrusions ofthe first alignment patterns.

The foregoing general description and the following detailed descriptionare exemplary and explanatory and are intended to provide furtherexplanation of the claimed subject matter

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are included to provide a furtherunderstanding of the inventive concept, and are incorporated in andconstitute a part of this specification, illustrate exemplaryembodiments of the inventive concept, and, together with thedescription, serve to explain principles of the inventive concept.

FIG. 1 is a layout view of a liquid crystal display according to anexemplary embodiment of the present invention.

FIG. 2 is a cross-sectional view taken along a line II-II of FIG. 1.

FIG. 3 to FIG. 6 are views showing a manufacturing method of a firstdisplay panel according to an exemplary embodiment of the presentinvention.

FIG. 7 to FIG. 10 are views showing a manufacturing method of a seconddisplay panel according to an exemplary embodiment of the presentinvention.

DETAILED DESCRIPTION OF THE ILLUSTRATED EMBODIMENTS

In the following description, for the purposes of explanation, numerousspecific details are set forth in order to provide a thoroughunderstanding of various exemplary embodiments. It is apparent, however,that various exemplary embodiments may be practiced without thesespecific details or with one or more equivalent arrangements. In otherinstances, well-known structures and devices are shown in block diagramform in order to avoid unnecessarily obscuring various exemplaryembodiments.

In the accompanying figures, the size and relative sizes of layers,films, panels, regions, etc., may be exaggerated for clarity anddescriptive purposes. Also, like reference numerals denote likeelements.

When an element or layer is referred to as being “on,” “connected to,”or “coupled to” another element or layer, it may be directly on,connected to, or coupled to the other element or layer or interveningelements or layers may be present. When, however, an element or layer isreferred to as being “directly on,” “directly connected to,” or“directly coupled to” another element or layer, there are no interveningelements or layers present. For the purposes of this disclosure, “atleast one of X, Y, and Z” and “at least one selected from the groupconsisting of X, Y, and Z” may be construed as X only, Y only, Z only,or any combination of two or more of X, Y, and Z, such as, for instance,XYZ, XYY, YZ, and ZZ. Like numbers refer to like elements throughout. Asused herein, the term “and/or” includes any and all combinations of oneor more of the associated listed items.

Although the terms first, second, etc. may be used herein to describevarious elements, components, regions, layers, and/or sections, theseelements, components, regions, layers, and/or sections should not belimited by these terms. These terms are used to distinguish one element,component, region, layer, and/or section from another element,component, region, layer, and/or section. Thus, a first element,component, region, layer, and/or section discussed below could be termeda second element, component, region, layer, and/or section withoutdeparting from the teachings of the present disclosure.

Spatially relative terms, such as “beneath,” “below,” “lower,” “above,”“upper,” and the like, may be used herein for descriptive purposes, and,thereby, to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the drawings. Spatiallyrelative terms are intended to encompass different orientations of anapparatus in use, operation, and/or manufacture in addition to theorientation depicted in the drawings. For example, if the apparatus inthe drawings is turned over, elements described as “below” or “beneath”other elements or features would then be oriented “above” the otherelements or features. Thus, the exemplary term “below” can encompassboth an orientation of above and below. Furthermore, the apparatus maybe otherwise oriented (e.g., rotated 90 degrees or at otherorientations), and, as such, the spatially relative descriptors usedherein interpreted accordingly.

The terminology used herein is for the purpose of describing particularembodiments and is not intended to be limiting. As used herein, thesingular forms, “a,” “an,” and “the” are intended to include the pluralforms as well, unless the context clearly indicates otherwise. Moreover,the terms “comprises,” “comprising,” “includes,” and/or “including,”when used in this specification, specify the presence of statedfeatures, integers, steps, operations, elements, components, and/orgroups thereof, but do not preclude the presence or addition of one ormore other features, integers, steps, operations, elements, components,and/or groups thereof.

Unless otherwise defined, all terms (including technical and scientificterms) used herein have the same meaning as commonly understood by oneof ordinary skill in the art to which this disclosure is a part. Terms,such as those defined in commonly used dictionaries, should beinterpreted as having a meaning that is consistent with their meaning inthe context of the relevant art and will not be interpreted in anidealized or overly formal sense, unless expressly so defined herein.

FIG. 1 is a layout view of a liquid crystal display according to anexemplary embodiment of the present invention, and FIG. 2 is across-sectional view taken along a line II-II of FIG. 1.

Referring to FIG. 1 and FIG. 2, a liquid crystal display according to anexemplary embodiment of the present invention may include a firstdisplay panel 100 and a second display panel 200 facing each other, anda liquid crystal layer 3 interposed therebetween. The liquid crystallayer 3, as shown in FIG. 2, includes a plurality of liquid crystalmolecules.

The first display panel 100 of FIG. 2 will be described in the followingparagraphs.

A plurality of gate lines 121 are disposed on a first substrate 110,which may be made of an insulating material such as glass or plastic.

The gate lines 121 transmit a gate signal and may mainly extend in atransverse direction. Each gate line 121 includes a plurality of gateelectrodes 124 protruding upward.

A gate insulating layer 140 is disposed on the gate lines 121, asemiconductor layer 154 is disposed on the gate insulating layer 140,and a plurality of ohmic contacts, including the first and second ohmiccontacts 163 and 165 may be disposed on the semiconductor layer 154.

The semiconductor layer 154 may be made of amorphous silicon, and thefirst and second ohmic contacts 163 and 165 may be formed of a materialsuch as n+ hydrogenated amorphous silicon in which an n-type impurity isdoped at a high concentration, or of a silicide, but it is not limitedthereto. The semiconductor 154 together with the ohmic contacts 163 and165 may be referred to as a semiconductor, and the semiconductor mayinclude a polysilicon semiconductor or an oxide semiconductor.

A plurality of data lines 171, including a plurality of sourceelectrodes 173 extending toward the gate electrode 124, and a pluralityof drain electrodes 175, separated from the data lines 171 and facingthe source electrodes 173 with respect to the gate electrode 124, may bedisposed on the first and second ohmic contacts 163 and 165 and the gateinsulating layer 140.

The first and second ohmic contacts 163 and 165 may be disposed betweenthe semiconductor layer 154, the data line 171, and drain electrode 175,and may lower contact resistance therebetween.

One gate electrode 124, one source electrode 173, and one drainelectrode 175 may constitute one thin film transistor (TFT) along withthe semiconductor 154. The channel of the thin film transistor may beformed on the semiconductors 154 between the source electrode 173 andthe drain electrode 175.

A passivation layer 180 is disposed on the gate insulating layer 140,the data line 171, and the drain electrode 175. A contact hole 185exposing the drain electrode 175 is formed in the passivation layer 180.The passivation layer 180 may be made of an organic insulator, and thesurface may be flat.

The passivation layer 180 may have a dual-layer structure including alower inorganic layer and an upper organic layer so that high insulatingcharacteristics of the organic layer may be ensured and there may be noor less damage to the exposed portions of the semiconductors 154.

A pixel electrode 191 is disposed on the passivation layer 180. Thepixel electrode 191 may be made of a transparent conductive materialsuch as indium tin oxide (ITO) or indium zinc oxide (IZO), or areflective metal such as aluminum or silver, or alloys thereof. Thepixel electrode 191 contacts the drain electrode 175 through the contacthole 185.

A first alignment pattern layer 15 is formed on the pixel electrode 191.The first alignment pattern layer 15 may include a plurality of firstalignment patterns 15 a. A plurality of first alignment patterns 15 amay be disposed to be separated by a predetermined interval, and thepitch thereof may be, for example, less than 50 nm. Also, the thicknessof the first alignment patterns 15 a may be, for example, less than 20nm. However, aspects of the invention are not limited thereto. Here, thepitch may refer to, without limitation, a sum of a width of one firstalignment pattern 15 a and an interval between adjacent first alignmentpatterns 15 a.

A first alignment layer 12 is formed or disposed on the pixel electrode191 and the first alignment pattern layer 15. The first alignment layer12 may be made of a photoalignment material and formed by irradiatingultraviolet rays.

The second display panel 200 of FIG. 2 will be described in thefollowing paragraphs.

A light blocking member 220 is formed or disposed on a second substrate210 which may be made of an insulating material such as glass orplastic, but is not limited thereto. Color filters including a red colorfilter 230R, a green color filter 230G, and a blue color filter 230B areformed or disposed on the light blocking member 220.

A common electrode 270 is formed or disposed on the light blockingmember 220 and the red, green, and blue color filters 230R, 230G, and230B.

A second alignment pattern layer 25 is formed or disposed on the commonelectrode 270. The second alignment pattern layer 25 may include aplurality of second alignment patterns 25 a. A plurality of secondalignment patterns 25 a may be disposed to be separated from each otherby a predetermined interval. The plurality of second alignment patterns25 a are respectively separated by the predetermined interval. The pitchof the second alignment patterns 25 a may be, for example, less than 50nm. In an example, the thickness of the second alignment pattern 25 amay be less than 20 nm.

A second alignment layer 22 is formed or disposed on the commonelectrode 270 and the second alignment pattern layer 25. The secondalignment layer 22 may be made of the photoalignment material and may beformed by irradiating ultraviolet rays.

A shape of the first alignment pattern 15 a and the second alignmentpattern 25 a may have a cross-section in the shape of, for example, aquadrangle, a triangle, or a circle, but is not limited thereto.

The first alignment pattern layer 15 and the second alignment patternlayer 25 may form a photosensitive film pattern layer. Thephotosensitive film pattern layer may be a positive photosensitive filmpattern layer or a negative photosensitive film pattern layer.

Also, the first alignment pattern layer 15 and the second alignmentpattern layer 25 may each be a pattern layer formed of a polymer suchas, for example, a polyimide.

Also, the first alignment pattern layer 15 and the second alignmentpattern layer 25 may be a wire grid polarizer (WGP) pattern layer.

The first alignment layer 12 and the second alignment layer 22respectively may have protrusions and/or depressions including groovesand protrusions formed by the first alignment pattern layer 15 and thesecond alignment pattern layer 25. An alignment layer irradiated withultraviolet rays may have a lower anchoring energy than an alignmentlayer processed with a contact type rubbing process. In an exemplaryembodiment, the first alignment layer 12 and the second alignment layer22 may have the protrusions and/or depressions included in theconcave-convex shape, and the alignment may be controlled by theinteraction between the grooves and liquid crystal molecules of theliquid crystal layer 3. Accordingly, the generation of afterimages maybe reduced.

Also, in an exemplary embodiment, the first alignment layer 12 and thesecond alignment layer 22 may be formed by irradiating ultraviolet rayssuch that a scratch or a foreign particle according to the contactrubbing process may not remain on the alignment layer.

Referring to FIGS. 3 to 10 and FIG. 2, a manufacturing method of aliquid crystal display according to an exemplary embodiment of thepresent invention will be described in the following paragraphs.

FIG. 3 to FIG. 6 are views showing a manufacturing method of a firstdisplay panel, and FIG. 7 to FIG. 10 are views showing a manufacturingmethod of a second display panel according to exemplary embodiments ofthe present invention.

Referring to FIG. 3, thin film layers such as a gate line 121 includinga gate electrode 124, a gate insulating layer 140, a semiconductor layer154, ohmic contacts 163 and 165, a data line 171 including a sourceelectrode 173, a drain electrode 175, a passivation layer 180, and apixel electrode 191 may be formed on a first substrate 110 by usingvarious methods such as thin film deposition, photolithography,photo-etching, etc.

Referring to FIG. 4, after forming a photosensitive film 20 on the pixelelectrode 191 and the passivation layer 180, an exposure process ofirradiating ultraviolet rays to the photosensitive film 20 may beexecuted. The photosensitive film 20 may be a positive photosensitivefilm. However, aspects of the invention are not limited thereto, and thephotosensitive film 20 may be a negative photosensitive film as furtherexplained below.

The exposure process may use a mask 500. The mask 500 may include atransparent layer 510 and a light blocking layer 520. The light blockinglayer 520 is formed on portions of the transparent layer 510. Whenirradiating ultraviolet rays, the ultraviolet rays may not betransmitted on the portion in which the light blocking layer 520 isdisposed, while ultraviolet rays may be transmitted on the portion onwhich the light blocking layer 520 is not disposed. Ultraviolet rayspassing through the mask 500 may be radiated to the photosensitive film20 and the portion of the photosensitive film 20 irradiated withultraviolet rays may be hardened.

Referring to FIG. 5, the first alignment pattern layer 15 is formed onthe pixel electrode 191 and the passivation layer 180. The firstalignment pattern layer 15 may include a plurality of first alignmentpatterns 15 a.

If the photosensitive film 20 is developed, the portion that is notirradiated by ultraviolet rays may be removed while the portionirradiated by the ultraviolet rays may remain. The portion that remainmay form the first alignment pattern 15 a. In an example, the pitch ofthe first alignment patterns 15 a may be less than 50 nm and that thethickness of the first alignment pattern 15 a may be less than 20 nm,however, aspects of the invention are not limited thereto.

Referring to FIG. 4 and FIG. 5, a positive photosensitive film may beused, however, it is not limited thereto, and a negative photosensitivefilm may be used. When using the negative photosensitive film, after thedevelopment, the portion irradiated with ultraviolet rays may beremoved, while the portion that is not irradiated with ultraviolet raysmay remain, and may form the first alignment patterns 15 a.

Also, instead of a photosensitive film 20 a polymer material such as apolyimide may be used. After forming the polymer material layer, thephotosensitive film pattern may be formed on the polymer material layer.The polymer material layer may then be etched by using thephotosensitive film pattern as a mask to form the first alignmentpatterns 15 a.

Referring to FIG. 6, the photoalignment material layer is formed on thepixel electrode 191 and the first alignment pattern layer 15, andultraviolet rays may be irradiated to form the first alignment layer 12.The first alignment layer 12 may have the concave-convex shape includingthe grooves and the protrusions formed by the first alignment patternlayer 15.

Referring to FIG. 7, thin films such as a light blocking member 220,red, green, and blue color filters 230R, 230G, and 230B, and a commonelectrode 270 may be formed on a second substrate 210 by using variousmethods such as thin film deposition, photolithography, andphoto-etching, etc.

Referring to FIG. 8, after forming a photosensitive film 20 on thecommon electrode 270, an exposure process of irradiating ultravioletrays to the photosensitive film 20 may be executed.

Referring to FIG. 8, the photosensitive film 20 may be a positivephotosensitive film, but is not limited thereto.

The exposure process may use the mask 500. The mask 500 may include thetransparent layer 510 and the light blocking layer 520. The lightblocking layer 520 is formed on portions of the transparent layer 510.When irradiating ultraviolet rays, ultraviolet rays are not transmittedon the portion in which the light blocking layer 520 is disposed, whileultraviolet rays are transmitted on the portion on which the lightblocking layer 520 is not disposed. Ultraviolet rays passing through themask 500 may be radiated to the photosensitive film 20, and the portionof the photosensitive film 20 irradiated with ultraviolet rays may behardened.

Referring to FIG. 9, a second alignment pattern layer 25 is formed onthe common electrode 270. The second alignment pattern layer 25 mayinclude a plurality of second alignment patterns 25 a.

If the photosensitive film 20 is developed, the portion that is notirradiated by ultraviolet rays may be removed, while the portionirradiated by the ultraviolet rays may remain. The portions that remainmay form the second alignment pattern 25 a. In an example, the pitch ofthe second alignment patterns 25 a may be less than 50 nm and that thethickness of the first alignment pattern 15 a may be less than 20 nm.

Referring to FIG. 8 and FIG. 9, the positive photosensitive film may beused, however, it is not limited thereto, and the negativephotosensitive film may be used. When using the negative photosensitivefilm, after the development, the portion irradiated with ultravioletrays is removed and the portion that is not irradiated with ultravioletrays remains, and may form the first alignment patterns 15 a.

Also, when a polymer material such as a polyimide is used, after formingthe polymer material layer, the photosensitive film pattern may beformed on the polymer material layer. The polymer material layer maythen be etched by using the photosensitive film pattern as a mask toform the second alignment patterns 25 a.

Referring to FIG. 10, the photoalignment material layer is formed on thecommon electrode 270 and ultraviolet rays may be radiated to form thesecond alignment layer 22. The second alignment layer 22 may have theconcave-convex shape including the grooves and the protrusions formed bythe second alignment pattern layer 25.

Referring to FIG. 2, after combining the first display panel 100 and thesecond display panel 200, liquid crystal molecules may be injectedbetween the first display panel 100 and the second display panel 200 toform the liquid crystal layer 3. For the formation of the liquid crystallayer 3, the liquid crystal molecules may be dripped on the firstdisplay panel 100 or the second display panel 200, and then the firstdisplay panel 100 and the second display panel 200 may be combined toface each other.

Although certain exemplary embodiments and implementations have beendescribed herein, other embodiments and modifications will be apparentfrom this description. Accordingly, the inventive concept is not limitedto such embodiments, but rather to the broader scope of the presentedclaims and various obvious modifications and equivalent arrangements.

What is claimed is:
 1. A liquid crystal display comprising: a gate linedisposed on a first substrate; a gate insulating layer disposed on thegate line; a semiconductor layer disposed on the gate insulating layer;a data line, comprising a source electrode, disposed on thesemiconductor layer; a drain electrode disposed on the semiconductorlayer, the drain electrode facing the source electrode via thesemiconductor layer interposed therebetween; a passivation layerdisposed on the data line and the drain electrode; a pixel electrode,connected to the drain electrode, disposed on the passivation; a firstalignment pattern layer disposed on the pixel electrode; and a firstalignment layer disposed on the pixel electrode and the first alignmentpattern layer, the first alignment layer comprising a photoalignmentmaterial, wherein the first alignment pattern layer comprises aplurality of first alignment patterns separated by a predeterminedinterval, and the first alignment layer is configured in aconcave-convex shape including grooves and protrusions.
 2. The liquidcrystal display of claim 1, wherein a pitch of the first alignmentpatterns is less than 50 nm, and a thickness of the first alignmentpattern is less than 20 nm.
 3. The liquid crystal display of claim 1,further comprising: a second substrate facing the first substrate; acolor filter disposed on the second substrate; a common electrodedisposed on the color filter; a second alignment pattern layer disposedon the common electrode; and a second alignment layer, comprising thephotoalignment material, disposed on the common electrode, wherein thesecond alignment pattern layer comprises a plurality of second alignmentpatterns separated by a predetermined interval, and the second alignmentlayer is configured in the concave-convex shape including the groovesand the protrusions.
 4. The liquid crystal display of claim 3, whereinthe pitch of the second alignment patterns is less than 50 nm, and thethickness of the second alignment pattern is less than 20 nm.
 5. Theliquid crystal display of claim 4, wherein the first alignment patternand the second alignment pattern comprise a photosensitive film pattern.6. The liquid crystal display of claim 4, wherein the first alignmentpattern and the second alignment pattern comprise a polymer pattern. 7.The liquid crystal display of claim 4, wherein the first alignmentpattern and the second alignment pattern comprise a wire grid pattern.8. A method for manufacturing a liquid crystal display, comprising:forming a first display panel; forming a second display panel; andcombining the first display panel and the second display panel, whereinthe forming of the first display panel comprises: sequentially disposinga gate line, a semiconductor layer, a data line, a drain electrode, apassivation layer, and a pixel electrode on the first substrate;disposing a first alignment pattern layer on the passivation layer andthe pixel electrode; and disposing a first alignment layer on the pixelelectrode and the first alignment pattern layer, wherein the firstalignment pattern layer comprises a plurality of first alignmentpatterns separated by a predetermined interval, and the first alignmentlayer is configured in a concave-convex shape including grooves andprotrusions.
 9. The method of claim 8, wherein a pitch of the firstalignment patterns is less than 50 nm, and a thickness of the firstalignment pattern is less than 20 nm.
 10. The method of claim 9, whereindisposing the first alignment pattern layer comprises: disposing aphotosensitive film on the passivation layer and the pixel electrode;irradiating ultraviolet rays to the photosensitive film by using a mask,the mask comprising a transparent layer and a light blocking layer; anddeveloping the photosensitive film.
 11. The method of claim 10, whereindisposing the first alignment layer comprises: disposing aphotoalignment material layer on the pixel electrode and the firstalignment pattern layer; and radiating ultraviolet rays to thephotoalignment material layer.
 12. The method of claim 8, wherein theforming of the second display panel comprises: sequentially disposing acolor filter and a common electrode on a second substrate; disposing asecond alignment pattern layer on the common electrode; and disposing asecond alignment layer on the common electrode and the second alignmentpattern layer.
 13. The method of claim 12, wherein the second alignmentpattern layer comprises a plurality of second alignment patternsseparated by a predetermined interval, and the second alignment layer isconfigured in the concave-convex shape including the grooves and theprotrusions.
 14. The method of claim 13, wherein the pitch of the secondalignment patterns is less than 50 nm, and the thickness of the secondalignment pattern is less than 20 nm.
 15. The method of claim 14,wherein the disposing of the second alignment pattern layer comprises:disposing photosensitive film on the common electrode; radiatingultraviolet rays to photosensitive film by using a mask, the maskcomprising a transparent layer and a light blocking layer; anddeveloping the photosensitive film irradiated with ultraviolet rays. 16.The method of claim 15, wherein the disposing of the second alignmentlayer comprises: disposing a photoalignment material layer on the commonelectrode and the first alignment pattern layer; and radiatingultraviolet rays to the photoalignment material layer.